| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of processing a glass substrate by which a pattern faithful to a shape pattern of a photomask can be provided in a thin glass substrate which deforms when provided with a film used as etching mask. SOLUTION: The method of processing the glass substrate includes: a film forming process for providing a film on a glass substrate, which film serves as an etching mask for etching of the glass substrate; a first pattern film forming process for forming a first pattern film by dividing the film into a plurality of parts by providing a dividing pattern in the film; a second pattern film forming process comprising photolithography treatment using a photomask and etching treatment for forming a second pattern film by further providing a shape pattern in the first pattern film, which shape pattern is used for processing the glass substrate to have a shape; and an etching treatment process for etching the glass substrate by using the second pattern film as etching mask. COPYRIGHT: (C)2008,JPO&INPIT
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