EXPOSURE DEVICE FOR EDGE OF SUBSTRATE

摘要

An apparatus for exposing the edge of a substrate is provided to eliminate the necessity for a process for removing an edge photoresist layer by cleanly removing a photoresist layer deposited at the edge of a substrate. A reflection plate reflects the light emitted from a lamp downward. A first reflection mirror reflects the light transferred from the lamp and the reflection plate to modify a path. A second reflection mirror(230) reflects the light transferred from the first reflection mirror to modify a path. A slot plate has a slot through which more than part of the light transferred from the second reflection mirror passes. Light is transferred to the edge of the substrate positioned under the slot plate through the slot. A lens is disposed between the second reflection mirror and the slot plate, condensing the light transferred from the second reflection mirror and transferring the condensed light to the slot plate.