发明名称 PATTERN CORRECTING METHOD AND PATTERN CORRECTING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a pattern correcting method in which an electrode breaking part etc., are corrected with a thin wire of about 10μm and a defective portion periphery is less damaged and contaminated. SOLUTION: In the pattern correcting method, a low-viscosity film 41 is irradiated with laser light in the state wherein the defective portion is not irradiated with the laser light to form a mask 40 having a hole 40a, the mask 40 is stuck to a substrate 14, and correction liquid 20 is applied to the defective portion 13a through the hole 40a. Consequently, a periphery of the defective portion 13a is prevented from being damaged by the laser light, and the correction liquid 20 is prevented from entering the gap between the mask 40 and substrate 14. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007333868(A) 申请公布日期 2007.12.27
申请号 JP20060163516 申请日期 2006.06.13
申请人 NTN CORP 发明人 KOIKE TAKASHI;SHIMIZU SHIGEO
分类号 G09F9/00;G02F1/13;G02F1/1343;G02F1/1345;H01J9/50 主分类号 G09F9/00
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