| 摘要 |
A substrate drying apparatus and a drying method of the same are provided to improve surface quality by drying uniformly residual resists, moisture, solvents during a short time. An upper cover part includes an upper cover(110) of a rectangular shape, an exhaust port(120) formed at a center thereof, and an O-ring groove formed at a rim of the upper cover. A lower cover part includes a lower cover(210) corresponding to the upper cover, a hot plate(220) having a heater, and an O-ring groove formed at a lower surface adjacent to a rim of the lower cover. A flexible air supply tube(340) is connected to a lateral cover having an air supply path(330). A sealing plate(320) includes an O-ring corresponding to the O-ring groove. A lateral sealing part is formed to seal a lateral space between the upper cover part and the lower cover part in order to form a chamber. A lifter is connected to two opposite lateral sealing parts in order to move upwardly and downwardly the lateral sealing parts. A ratio of an exhaust hole of the air supply path has a ratio of 1:5 to 1:10. The exhaust hole is directed to a ceiling surface of the chamber or the loaded substrate.
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