发明名称 |
Photodefinable low dielectric constant material and method for making and using same |
摘要 |
A photodefinable, organosilicate material having a dielectric constant (kappa) of 3.5 or below and a method for making and using same, for example, in an electronic device, is described herein. In one aspect, there is provided a composition for preparing a photodefinable material comprising: a silica source capable of being sol-gel processed and having a molar ratio of carbon to silicon within the silica source contained therein of at least 0.5 or greater; a photoactive compound; optionally a solvent; and water provided the composition contains 0.1% by weight or less of an added acid where the acid has a molecular weight of 500 or less.
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申请公布号 |
US2007299176(A1) |
申请公布日期 |
2007.12.27 |
申请号 |
US20060341334 |
申请日期 |
2006.01.27 |
申请人 |
MARKLEY THOMAS J;WEIGEL SCOTT J;KRETZ CHRISTINE P;BRAYMER THOMAS A;MAC DOUGALL JAMES E;PETIT CECILIA A P |
发明人 |
MARKLEY THOMAS J.;WEIGEL SCOTT J.;KRETZ CHRISTINE P.;BRAYMER THOMAS A.;MAC DOUGALL JAMES E.;PETIT CECILIA A.P. |
分类号 |
B05D3/02;B05D3/06;B60C1/00;C08L83/04 |
主分类号 |
B05D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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