PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND PHOTOELECTRIC CONVERSION ELEMENT

摘要

In the case of performing at least two plasma processing steps in a same plasma reaction chamber (101), CW alternating power or pulse-modulated alternating power is selected as needed as power for plasma processing in each step. Thus, even in a step where plasma processing conditions are limited due to apparatus configuration, more diversified plasma processing can be performed. Furthermore, uniform plasma can be generated between electrodes and power to be supplied between the electrodes can be reduced, by using the pulse-modulated alternating power. Since plasma processing speed can be reduced, processing quantity control is facilitated.