| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a liquid crystal display device with a large size, a wide viewing angle and fast response in three photolithographic processes. SOLUTION: After a gate electrode, a common electrode, a pixel electrode and a contact pad are formed by halftone exposure techniques, an a-Si island and a contact hole are formed by halftone exposure techniques. A source electrode, a drain electrode, an alignment control electrode are formed by normal exposure techniques. A passivation layer is formed by a P-CVD method using a masking deposition or an ink-jet coating method or a spray coating so as to locally apply the passivation layer. Thus, a TFT array substrate for the liquid crystal display with a large size, a wide viewing angle and fast response can be manufactured in three photolithographic processes. COPYRIGHT: (C)2008,JPO&INPIT |
