发明名称 MANUFACTURING METHOD OF WIRING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a wiring substrate having a structure wherein an electrically connected unit is installed with high density. SOLUTION: The manufacturing method of wiring substrate having the electrically connected unit formed by etching a conductive layer comprises a first process for forming a mask pattern on the conductive layer, and a second process for forming the electrically connected part by etching the conductive layer employing the mask pattern as a mask. In this case, the mask pattern is formed in the first process so that the end side of the same is warped toward the side of the conductive layer upon etching in the second process. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007335571(A) 申请公布日期 2007.12.27
申请号 JP20060164594 申请日期 2006.06.14
申请人 SHINKO ELECTRIC IND CO LTD 发明人 KURASHIMA NOBUYUKI
分类号 H05K3/06;H05K3/36;H05K3/46 主分类号 H05K3/06
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