发明名称 METHOD FOR PRODUCING ALUMINUM NITRIDE-CONTAINING MATERIAL, ALUMINUM NITRIDE-CONTAINING MATERIAL AND RADIATOR OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing an aluminum nitride-containing material producible at a lower production cost comparing with heretofore. SOLUTION: The production method comprises the processes for: arranging aluminum pieces 21 on boron nitride powders or particles 20; generating an aluminum nitride-containing material by heating the boron nitride 20 and aluminum piece 21 at a temperature of 900 to 1,300°C in a nitrogen atmosphere of 5-30 atm to melt the aluminum piece (a first heat treatment process); cooling the resultant material; and increasing the content of aluminum nitride in the above material by re-heating the material at the temperature of 900 to 1,300°C in the nitrogen atmosphere of 5-30 atm. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007331995(A) 申请公布日期 2007.12.27
申请号 JP20060167473 申请日期 2006.06.16
申请人 TAMA TLO KK 发明人 KIYOMIYA YOSHIHIRO;OTSUKA KANJI;HASHIMOTO SHINYA;NAKADA YOSHIYUKI;SHINODA SHIGENARI;YAMAGUCHI TOSHIHISA;SAKURAI TOSHIAKI
分类号 C01B21/072;C22C29/16;H01L23/36 主分类号 C01B21/072
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