FILM DEPOSITION METHOD, FILM DEPOSITION APPARATUS, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition apparatus excellent in step coverage, and capable of consistently feeding a raw material and practically depositing a metal film of excellent quality without degrading the raw material. SOLUTION: The film deposition method comprises a step of generating a carboxylate gas by reacting a carboxylic acid with an oxygen-containing metal compound, a step of depositing a carboxylate film 2 by feeding the carboxylate gas on a substrate 1, and a step of decomposing the carboxylate film 2 and depositing a metal film 3 by supplying the energy to the substrate 1 with the carboxylate film 2 deposited thereon. COPYRIGHT: (C)2008,JPO&INPIT