发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 <p>A semiconductor device is provided with a supporting substrate; a first device section bonded on the supporting substrate; and a second device section formed on the supporting substrate. The first device section has an SOI structure, which is composed of an insulating layer and a semiconductor layer which is laminated on the insulating layer and includes a low-concentration active region and a high-concentration active region. In the first device section, a first conductor layer facing the low-concentration active region and a second conductor layer facing at least a part of the high-concentration active region are formed. The second device section is electrically connected to the second conductor layer.</p>
申请公布号 WO2007148448(A1) 申请公布日期 2007.12.27
申请号 WO2007JP51470 申请日期 2007.01.30
申请人 TADA, KENSHI;SHARP KABUSHIKI KAISHA 发明人 TADA, KENSHI
分类号 H01L21/265;H01L21/336;H01L21/02;H01L21/8234;H01L27/08;H01L27/088;H01L27/12;H01L29/786 主分类号 H01L21/265
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