发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME |
摘要 |
<p>A semiconductor device is provided with a supporting substrate; a first device section bonded on the supporting substrate; and a second device section formed on the supporting substrate. The first device section has an SOI structure, which is composed of an insulating layer and a semiconductor layer which is laminated on the insulating layer and includes a low-concentration active region and a high-concentration active region. In the first device section, a first conductor layer facing the low-concentration active region and a second conductor layer facing at least a part of the high-concentration active region are formed. The second device section is electrically connected to the second conductor layer.</p> |
申请公布号 |
WO2007148448(A1) |
申请公布日期 |
2007.12.27 |
申请号 |
WO2007JP51470 |
申请日期 |
2007.01.30 |
申请人 |
TADA, KENSHI;SHARP KABUSHIKI KAISHA |
发明人 |
TADA, KENSHI |
分类号 |
H01L21/265;H01L21/336;H01L21/02;H01L21/8234;H01L27/08;H01L27/088;H01L27/12;H01L29/786 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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