发明名称 |
SILICON NITRIDE FILM ABRASIVE POWDER AND ABRADING METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an abrasive powder and an abrading method having a high abrading speed to a silicon nitride film and capable of more selectively abrading the silicon nitride film than a silicon oxide film. <P>SOLUTION: The silicon nitride film abrasive powder, wherein water and silicon oxide as abrasive grains are included and pH is 3 or higher and 5.5 or less and the abrading method for abrading the silicon nitride film with the abrasive powder. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
申请公布号 |
JP2007335847(A) |
申请公布日期 |
2007.12.27 |
申请号 |
JP20070113034 |
申请日期 |
2007.04.23 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
NISHIYAMA MASAYA;ENOMOTO KAZUHIRO;KIMURA TADAHIRO;ONO YUTAKA;UEDA SHUNSUKE |
分类号 |
H01L21/304;B24B37/00;C09K3/14 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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