发明名称 SILICON NITRIDE FILM ABRASIVE POWDER AND ABRADING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an abrasive powder and an abrading method having a high abrading speed to a silicon nitride film and capable of more selectively abrading the silicon nitride film than a silicon oxide film. <P>SOLUTION: The silicon nitride film abrasive powder, wherein water and silicon oxide as abrasive grains are included and pH is 3 or higher and 5.5 or less and the abrading method for abrading the silicon nitride film with the abrasive powder. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007335847(A) 申请公布日期 2007.12.27
申请号 JP20070113034 申请日期 2007.04.23
申请人 HITACHI CHEM CO LTD 发明人 NISHIYAMA MASAYA;ENOMOTO KAZUHIRO;KIMURA TADAHIRO;ONO YUTAKA;UEDA SHUNSUKE
分类号 H01L21/304;B24B37/00;C09K3/14 主分类号 H01L21/304
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