发明名称 METHOD OF FORMING CONDUCTOR PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a method of forming a conductor pattern that is independent of the density of pattern and can establish the uniformity of film thickness. SOLUTION: This method includes an electrolytic plating step wherein a conductor pattern is formed on a base metal film formed on an insulation substrate, by using a plating liquid containing a plating accelerating additive agent for reducing deposit overvoltage of plating metal. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007335470(A) 申请公布日期 2007.12.27
申请号 JP20060162704 申请日期 2006.06.12
申请人 HITACHI CABLE LTD 发明人 HASHIBA TOSHIO;SUZUKI HITOSHI;SATO NAOTO;AKABOSHI HARUO;YOSHIDA HIROSHI;CHINDA SATOSHI
分类号 H05K3/18 主分类号 H05K3/18
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