发明名称 Fabrication method and structure of an ITO anode containing nickel for improving injection efficiency of an OLED
摘要 A fabrication method of an indium tin oxide (ITO) anode containing nickel for improving injection efficiency of an organic light emitting diode (OLED) includes various processes of preparing an ITO substrate with an anode, of preparing a target source of ITO containing nickel, and of mingling nickel on the anode of the ITO substrate by sputtering. The structure of the ITO anode containing nickel for an OLED includes a substrate with an anode mingled with nickel, a hole transport layer and an electron transport layer. Such an ITO anode is to have a higher work function that can lessen a great potential barrier between the ITO anode and a hole transport layer. So the threshold voltage and the turn-on voltage of OLED can be reduced to advance hole injection efficiency.
申请公布号 US2007298283(A1) 申请公布日期 2007.12.27
申请号 US20060471477 申请日期 2006.06.21
申请人 CHING-MING HSU 发明人 HSU CHING-MING;WU WEN-TUAN;LEE HSIN-HUI
分类号 H01L51/50;B32B9/00;C23C14/00;H01L51/56;H05B33/26 主分类号 H01L51/50
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