| 摘要 |
<p>An immersion lithography apparatus is provided to prevent generation of watermark by additionally and obliquely blowing air from the lateral surface of a wafer stage to the side of the wafer. An immersion lithography apparatus includes a wafer stage(100), a projection lens part(130), an air exhaust part(140) and an air absorption part(150). A watermark removing air exhaust part(140') is included in the lateral surface of the wafer stage. Air is obliquely blown to a contact portion of water and a wafer(110) to push up watermark.</p> |
