发明名称 |
Method for forming dual fully silicided gates and devices obtained thereby |
摘要 |
<p>A method for manufacturing CMOS devices with fully silicided (FUSI) gates is described. A metallic gate electrode of an nMOS transistor and a metallic gate electrode of a pMOS transistor have a different work function. The work function of each transistor type is determined by selecting a thickness of a corresponding semiconductor gate electrode and a thermal budget of a first thermal step such that, during silicidation, different silicide phases are obtained on the nMOS and the pMOS transistors. Optionally, the work function of each type of transistor can be adjusted by selectively doping the semiconductor material prior to the formation of the silicide.
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申请公布号 |
EP1724828(A3) |
申请公布日期 |
2007.12.26 |
申请号 |
EP20060114045 |
申请日期 |
2006.05.16 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM ( IMEC);KONINKLIJKE PHILIPS ELECTRONICS N.V.;TEXAS INSTRUMENTS INCORPORATED |
发明人 |
KITTL, JORGE ADRIAN;LAUWERS, ANNE;VELOSO, ANABELA;KOTTANTHARAYIL, ANIL;VAN DAL, MARCUS JOHANNES HENRICUS |
分类号 |
H01L21/8234;H01L21/28;H01L21/8238;H01L27/092 |
主分类号 |
H01L21/8234 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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