METHOD OF MANUFACTURING TRANSPARENT THIN FILM TRANSISTOR

摘要

A method for manufacturing a transparent thin film transistor is provided to reduce a manufacturing cost by simplifying a manufacturing process of the transparent thin film transistor. A gate electrode(21) is formed on a substrate(10). A gate insulating layer(23) is formed on the gate electrode. A transparent semiconductor layer(25) of a patterned state is formed on the gate insulating layer. A photoresist layer(30) is formed on the transparent semiconductor layer in order to expose the source region and the drain region of the transparent semiconductor layer. The exposed source and drain regions are surface-processed by using the photoresist layer as a mask. A conductive layer is formed on an entire surface of the substrate. The conductive layer is patterned by removing the photoresist layer so that a source electrode contacts the source region of the transparent semiconductor layer and a drain electrode contacts the drain region of the transparent semiconductor layer.