| 摘要 |
An apparatus for inspecting a pattern is provided to easily inspect a pattern including a phase defect and a pattern defect at a high speed by detecting the intensity of reflection light and using an astigmatism method. An optical source(1) emits an optical beam. A condenser condenses the optical beam on a pattern to form an optical spot. A scanning part scans the pattern by using the optical spot. A beam splitter(5,10) splits the optical beam reflected from the position of the optical spot on the pattern into a first reflective optical beam in a first optical path and a second reflective optical beam in a second optical path. A reflection detecting part receives the first reflective optical beam to output a first optical intensity signal. An astigmatic detection part(100) receives the second reflective optical beam to output a second optical intensity signal by an astigmatism method wherein the second optical intensity signal indicates a phase distribution of the second reflective optical beam. An image process part(13) outputs an inspection image signal indicating an inspection result of the pattern based upon the first optical intensity signal and the second optical intensity signal. The pattern can include a mask pattern made of a mask layer disposed on the surface of a base or a translucent pattern made of a translucent mask layer disposed on the surface of the base.
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