发明名称 Spin coating apparatus and coating method of composition for antireflection layer
摘要 <p>A spin coating apparatus includes a cleaning liquid ejection device (11) that supplies a cleaning liquid primarily containing water to a surface of a lens base material, an antireflection-layer composition ejection device (12) that supplies a composition for an antireflection layer to form an antireflection layer on the surface of the lens base material, a holding portion that rotatably holds the lens base material, a liquid storage portion that stores the liquids supplied from the cleaning liquid ejection device and the antireflection-layer composition ejection device to the lens base material and flowing down, an apparatus main body in which the lens base material is accommodated, an air supply device that supplies cleaning air to the apparatus main body, and an exhaust unit that exhausts contaminated air in the apparatus main body to the outside.</p>
申请公布号 EP1870738(A2) 申请公布日期 2007.12.26
申请号 EP20070011958 申请日期 2007.06.19
申请人 SEIKO EPSON CORPORATION 发明人 TAKADA, KEISUKE;KARASAWA, ISAO
分类号 G02B1/10;B05C11/08 主分类号 G02B1/10
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