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发明名称
MANUFACTURING METHOD OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
KR100788539(B1)
申请公布日期
2007.12.26
申请号
KR20060097111
申请日期
2006.10.02
申请人
发明人
分类号
H01L21/20;H01L21/205
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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