发明名称 |
APPARATUS AND METHOD FOR SUPERCRITICAL FLUID REMOVAL OR DEPOSITION PROCESSES |
摘要 |
A continuous-flow supercritical fluid (SCF) apparatus and method for the deposition of thin films onto microelectronic devices or the removal of unwanted layers, particles and/or residues from microelectronic devices having same thereon. The SCF apparatus preferably includes a dynamic mixer to ensure homogeneous mixing of the SCF and other chemical components.
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申请公布号 |
KR20070121057(A) |
申请公布日期 |
2007.12.26 |
申请号 |
KR20077026493 |
申请日期 |
2007.11.14 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS INC. |
发明人 |
KORZENSKI MICHAEL B.;GHENCIU ELIODOR G.;XU CHONGYING;BAUM THOMAS H.;VISINTIN PAMELA M. |
分类号 |
C23C16/00;C23G1/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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