发明名称 |
METHOD FOR INSPECTING PATTERN DEFECT, METHOD OF MANUFACTURING PHOTOMASK, AND METHOD OF MANUFACTURING SUBSTRATE FOR DISPLAY DEVICE |
摘要 |
<p>A method for inspecting pattern defects is provided to easily detect defects in a repetition pattern formed on a transparent substrate by irradiating light to a repetition pattern at a predetermined incidence angle by an illumination unit and by monitoring diffraction light generated by the light irradiation in a predetermined monitoring region on the repetition pattern by a monitoring unit. An object to be inspected is positioned on a transparent substrate(52) wherein a repetition pattern(51) in which unit patterns are periodically arranged is formed on the object. Light is irradiated to the repetition pattern at an incidence angle of theta I by an illumination unit(12). In a predetermined monitoring region on the repetition pattern, diffraction light formed by the irradiation of light is monitored by a monitoring unit(13) to detect whether a defect exits in the repetition pattern. At least part of the object to be inspected except the monitoring region is masked. The object to be inspected can be a photomask(50).</p> |
申请公布号 |
KR20070120899(A) |
申请公布日期 |
2007.12.26 |
申请号 |
KR20070060078 |
申请日期 |
2007.06.19 |
申请人 |
HOYA CORPORATION |
发明人 |
YAMAGUCHI NOBORU;NAKANISHI KATSUHIKO |
分类号 |
H01L21/027;G01N21/956;G03F1/84 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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