发明名称 Substrate transfer controlling apparatus and substrate transferring method
摘要 A substrate transfer controlling apparatus can easily maximize throughput of a substrate processing apparatus such as a semiconductor fabrication apparatus, and can satisfy a demand for immediacy of actions of a transfer device. The substrate transfer controlling apparatus includes an input device for inputting times required for actions of transfer devices and times required to process substrates in processing devices, and a schedule calculator for calculating execution times of actions of the transfer devices for allowing a time when a final one of the substrates to be processed is fully processed and returned from the substrate processing apparatus to be earliest, based on a predetermined conditional formula including, as parameters, the inputted times. The substrate transfer controlling apparatus further includes an action commander for instructing corresponding transfer devices to perform actions at calculated execution times of the actions of the transfer devices.
申请公布号 US7313452(B2) 申请公布日期 2007.12.25
申请号 US20060385760 申请日期 2006.03.22
申请人 EBARA CORPORATION 发明人 KOBAYASHI YOICHI;HIROO YASUMASA;OHASHI TSUYOSHI
分类号 G06F19/00;G06Q50/00;G06Q50/04;H01L21/00;H01L21/66 主分类号 G06F19/00
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