| 发明名称 |
Polarized radiation in lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.
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| 申请公布号 |
US7312852(B2) |
申请公布日期 |
2007.12.25 |
| 申请号 |
US20040022938 |
申请日期 |
2004.12.28 |
| 申请人 |
ASML NETHERLANDS B.V.;ZEISS CARL SMT AG |
发明人 |
WAGNER CHRISTIAN;DE BOEIJ WILHELMUS PETRUS;HEIL TILMANN;FIOLKA DAMIAN |
| 分类号 |
G03B27/72 |
主分类号 |
G03B27/72 |
| 代理机构 |
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