发明名称 Exposure apparatus and exposing method for elastically deforming a contact mask with control data
摘要 An exposure apparatus for exposing an object to be exposed by elastically deforming an exposing mask having a micro-opening pattern so as to bring the exposing mask into contact with the object includes a compression/decompression section for elastically deforming the exposing mask with compression/decompression so as to bring the exposing mask into contact with the object or into detachment from the object; and a controlling section for controlling the compression/decompression operation with the compression/decompression section. The controlling section controls the compression/decompression operation with the compression/decompression section based on control data prepared in advance.
申请公布号 US7312853(B2) 申请公布日期 2007.12.25
申请号 US20050167178 申请日期 2005.06.28
申请人 CANON KABUSHIKI KAISHA 发明人 KIRIYA SHINOBU
分类号 G03B27/64;G03B27/20 主分类号 G03B27/64
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