发明名称 VACUUM CHAMBER FOR VACUUM PLASMA NITRATION OF METALLIC DETAILS
摘要 A vacuum chamber for vacuum plasma nitration of metallic details contains a body with a lid and bottom in which device for detail hanging, protective screen, enveloping the mentioned device, hermetic input for detail connecting to the source of electric current and technological connecting pipe for pumping out of air from the cavity of vacuum chamber and presentation of active gases are disposed. The device for detail hanging is made in the form of the basis intended for its hard fixing in the cavity of vacuum chamber. On a basis a split disk is set, which disk is made from heat-resistant plastic electro isolation material, for example from fluoroplastic, in which from the side of end surface the radial orifice is made, which orifice is intended for connecting of detail to the source of electric current, and the through axial orifice, intended for fixing hanger for detail fixing in it, which hanger is made from wire.
申请公布号 UA29008(U) 申请公布日期 2007.12.25
申请号 UA20070010953 申请日期 2007.10.03
申请人 RUTKOVSKYI ANATOLII VITALIIOVYCH 发明人 RUTKOVSKYI ANATOLII VITALIIOVYCH;LIASHENKO BORYS ARTEMOVYCH
分类号 C23C4/10 主分类号 C23C4/10
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