| 摘要 |
A process liquid supplying apparatus is provided to enable discharge of a predetermined quantity at all times regardless of how much a filter is stopped up, by performing a feedback process by control of the rpm(revolution per minute) of a pump according to variation of a flowmeter. A process liquid supply apparatus includes a process liquid storing tank(5), a pump(6) for supplying process liquid, and a nozzle for discharging process liquid. When a dispenser turns on/off, a flowmeter(8) is included in the process liquid supply apparatus to add up the discharge quantity of process liquid discharged from initial discharging so that the discharge quantity of the process liquid from the nozzle is quantified. The flowmeter has a feedback system which varies the rpm of the pump according to the discharge quantity from the nozzle. The flowmeter can be electronic, ultrasonic or rotational.
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