APPRATUS FOR SUPPLYING CHEMICAL FOR SEMICONDUCTOR EQUIPMENTS, MONITORING CHEMICAL SUPPLY AND SUPPLYING CHEMICAL WITH MONITORING CAPABILITIES

摘要

A chemical supply apparatus for semiconductor equipment is provided to shorten an interval of process time and reduce the quantity of an unnecessarily wasted cleaning solution by including a chemical supply apparatus used in a cleaning process such that the chemical supply apparatus is an in-line system. A chemical valve(131) adjusts the quantity of supplied chemicals, connected to a chemical supply pipe. A DIW(deionized water) valve(132) adjusts the quantity of supplied DIW, connected to a DIW supply pipe. A chemical flowmeter(141) measures the quantity of supplied DIW flowing through the DIW supply pipe. A DIW flowmeter(142) measures the quantity of supplied DIW flowing through the DIW supply pipe. A mixture solution of the chemical and DIW flows through a mixture supply pipe connected to the end of the chemical supply pipe and the end of the DIW supply pipe. A heater block heats part of the mixture supply pipe. A DIW heater heats the end of the DIW supply pipe.