STAGE APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A stage apparatus (WST) is provided with a base section (63); a first moving member (62) which can relatively move to the base section (63); a second moving member (61) which holds a subject (W) and can relatively move to the first moving member (62); and measuring apparatuses (100, 200) for measuring characteristics of an energy beam (EL) to be applied on the subject (W). At least a part of the measuring apparatuses (100, 120) is arranged on the first moving member (62).