| 摘要 |
A cleaning system is provided to remove metal impurity, particles, dry etch residue and a resist mask made of an organic material by using an oxide material generated by electrolysis of sulfuric acid. A sulfuric acid electrolyzing part(10) includes an anode(32), a cathode(42), a partition(20) formed between the anode and the cathode, an anodic chamber(30) formed between the anode and the partition, and a cathodic chamber(40) formed between the cathode and the partition, electrolyzing a sulfuric acid solution to generate an oxide material in the anodic chamber. A concentrated sulfuric acid supplying part is structured in a manner that supplies a concentrated sulfuric acid solution to the anodic chamber. A cleaning process part(12) is structured to perform a cleaning process on a cleaning material by using an oxide solution including an oxide material. A solution circulating part(14) can be additionally structured to circulate an oxide solution through the sulfuric acid electrolyzing part and the cleaning process part.
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