METHOD AND APPARATUS FOR OPTICALLY CHARACTERIZING THE DOPING OF A SUBSTRATE

摘要

The invention relates to an optical characterization method that includes a step of evaluating the doping of a substrate (SUB) by means of a reflected beam coming from a light source, this method being carried out with an apparatus comprising: - this light source (LAS) for producing an incident beam (I) along an axis of incidence; - a first detector (DET1) for measuring the power of this reflected beam (R) along an axis of reflection, the axis of incidence and the axis of reflection intercepting at a measurement point and making a non-zero measurement angle (2T); and - a polarizer (POL) placed in the path of the incident beam (I). Furthermore the light source (LAS) is monochromatic. The invention also relates to an ion implanter equipped with this apparatus.