METHOD OF DRYING AN OBJECT AND APPARATUS FOR PERFORMING THE SAME

摘要

A drying method and an apparatus for performing the same are provided to remove fully deionized water from a semiconductor substrate by suppressing a condensing effect of mixed gas. A first heating process is performed to form a mixed gas by heating a first drying fluid and a second drying fluid(S240). A second heating process is performed to heat the mixed gas in order to prevent condensation of the mixed gas(S250). A filtering process is performed to filter the mixed gas in order to remove impurities from the mixed gas(S260). A drying process is performed to dry the filtered and mixed gas(S270). The first drying fluid includes nitrogen gas. The second drying fluid includes isopropyl alcohol. The first drying fluid is preheated before the first heating process is performed.