ELECTRON EMISSION DEVICE, MANUFACTURING METHOD OF THE DEVICE, AND ELECTRON EMISSION DISPLAY USING THE SAME

摘要

An electron emission device, a manufacturing method of the device, and an electron emission display using the same are provided to align a central axis of an electron emission unit with a central axis of a gate electrode opening unit by using a resistance layer as an exposure mask for patterning a mask layer and a sacrificial layer. A resistance layer(12) having an opening unit(121) and a conductive layer(14) separated from the opening unit are laminated on a substrate to form a cathode electrode(16). A transparent dielectric(18) and a transparent gate electrode(20) are formed on the cathode electrode. A first photoresist layer is formed on the top portion of the substrate. The first photoresist layer is patterned by a rear exposure and a development to form an opening unit corresponding to the opening unit of the resistance layer. The gate electrode exposed by the opening unit of the first photoresist layer and the dielectric which is formed under the gate electrode are partially etched to form opening units on the gate electrode and the dielectric. A second photoresist layer is formed on a top portion of the substrate. The second photoresist layer is patterned by a rear exposure and a development to form an opening unit corresponding to the opening unit of the resistance layer. An electron discharge material is applied to the opening unit of the second photoresist layer to form an electron discharge unit(30) on the opening unit of the resistance layer.