SHOWER PLATE, METHOD FOR MANUFACTURING THE SHOWER PLATE, PLASMA PROCESSING APPARATUS USING THE SHOWER PLATE, PLASMA PROCESSING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD

摘要

Provided is a shower plate which can completely prevent generation of plasma reverse flow or ignition of plasma excitation gas at a vertical hole section for more efficient plasma excitation. A shower plate (105) is arranged in a processing chamber (102) in a plasma processing apparatus, and discharges plasma excitation gas for generating plasma in the processing chamber (102). A porous gas communicating body (114) having pores communicating in a gas communicating direction is mounted on a vertical hole (112) to be a discharge path for the plasma excitation gas. The pore diameter of an overflow path in a gas communicating path formed by the communicating pores of the porous gas communicating body (114) is 10µm or less.