发明名称 |
COMPOSITIONS AND METHODS FOR POLISHING SILICON NITRIDE MATERIALS |
摘要 |
The present invention provides a method for polishing silicon nitride-containing substrates. The method comprises abrading a surface of a silicon nitride substrate with a polishing composition, which comprises colloidal silica, at least one acidic component, and an aqueous carrier. The at least one acidic component has a pKa in the range of 1 to 4.5. The composition has a pH in the range of 0.5 pH units less than the pKa of the at least one acidic component to 1.5 pH units greater than the pKa. |
申请公布号 |
WO2007146065(A1) |
申请公布日期 |
2007.12.21 |
申请号 |
WO2007US13424 |
申请日期 |
2007.06.07 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
DYSARD, JEFFREY;ANJUR, SRIRAM;JOHNS, TIMOTHY;CHEN, ZHAN |
分类号 |
C09K3/14 |
主分类号 |
C09K3/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|