发明名称 |
SURFACE ACOUSTIC WAVE DEVICE |
摘要 |
<p>A surface acoustic wave device (1) excellent in power resistance in which unwanted spurious can be suppressed effectively. The surface acoustic wave device (1) comprises an LiNbO<SUB>3</SUB> substrate (2) having an Euler angle (0°±5°, ?±5°, 0°±10°), an electrode formed on the LiNbO<SUB>3</SUB> substrate and including an IDT electrode (3) principally comprising Cu, a first silicon oxide film (6) formed to have a thickness equal to that of the electrode in the region other than the region where the electrode is formed, and a second silicon oxide film (7) so formed as to cover the electrode and the first silicon oxide film. The surface acoustic wave device (1) utilizes an SH wave, the duty D of the IDT electrode (3) is 0.49 or less, and the ? in the Euler angle (0°±5°, ?±5°, 0°±10°) falls within a range satisfying a predetermined formula (1).</p> |
申请公布号 |
WO2007145057(A1) |
申请公布日期 |
2007.12.21 |
申请号 |
WO2007JP60413 |
申请日期 |
2007.05.22 |
申请人 |
MURATA MANUFACTURING CO., LTD.;NISHIYAMA, KENJI;NAKAO, TAKESHI;KADOTA, MICHIO |
发明人 |
NISHIYAMA, KENJI;NAKAO, TAKESHI;KADOTA, MICHIO |
分类号 |
H03H9/25;H01L41/09;H01L41/18;H03H9/145 |
主分类号 |
H03H9/25 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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