发明名称 SURFACE ACOUSTIC WAVE DEVICE
摘要 <p>A surface acoustic wave device (1) excellent in power resistance in which unwanted spurious can be suppressed effectively. The surface acoustic wave device (1) comprises an LiNbO&lt;SUB&gt;3&lt;/SUB&gt; substrate (2) having an Euler angle (0°±5°, ?±5°, 0°±10°), an electrode formed on the LiNbO&lt;SUB&gt;3&lt;/SUB&gt; substrate and including an IDT electrode (3) principally comprising Cu, a first silicon oxide film (6) formed to have a thickness equal to that of the electrode in the region other than the region where the electrode is formed, and a second silicon oxide film (7) so formed as to cover the electrode and the first silicon oxide film. The surface acoustic wave device (1) utilizes an SH wave, the duty D of the IDT electrode (3) is 0.49 or less, and the ? in the Euler angle (0°±5°, ?±5°, 0°±10°) falls within a range satisfying a predetermined formula (1).</p>
申请公布号 WO2007145057(A1) 申请公布日期 2007.12.21
申请号 WO2007JP60413 申请日期 2007.05.22
申请人 MURATA MANUFACTURING CO., LTD.;NISHIYAMA, KENJI;NAKAO, TAKESHI;KADOTA, MICHIO 发明人 NISHIYAMA, KENJI;NAKAO, TAKESHI;KADOTA, MICHIO
分类号 H03H9/25;H01L41/09;H01L41/18;H03H9/145 主分类号 H03H9/25
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