发明名称 |
METHOD FOR MANUFACTURING DISPLAY SUBSTRATE |
摘要 |
<p>A method for fabricating a display substrate is provided to form an organic dielectric layer without forming a passivation layer by forming the organic dielectric layer after performing first washing, second washing and NH3 plasma processing. A TFT is formed on a substrate. NH3 plasma processing is performed on a substrate including the TFT. An organic dielectric layer is formed on the NH3 plasma processed substrate. A pixel electrode electrically contacting the TFT is formed on the organic dielectric layer. The forming of the TFT includes forming a gate electrode(110) on the substrate, forming a gate dielectric layer(120) on the substrate to cover the gate electrode, forming an active layer overlapping the gate electrode on the gate dielectric layer, and forming a source electrode(142) partially contacting the active layer and a drain electrode(144) separated from the source electrode at a predetermined interval and partially contacting the active layer.</p> |
申请公布号 |
KR20070119794(A) |
申请公布日期 |
2007.12.21 |
申请号 |
KR20060054168 |
申请日期 |
2006.06.16 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, YANG HO;KANG, HOON;KIM, JAE SUNG;LEE, HI KUK;WHANGBO, SANG WOO |
分类号 |
G02F1/136;H01L29/786 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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