发明名称 METHOD FOR MANUFACTURING DISPLAY SUBSTRATE
摘要 <p>A method for fabricating a display substrate is provided to form an organic dielectric layer without forming a passivation layer by forming the organic dielectric layer after performing first washing, second washing and NH3 plasma processing. A TFT is formed on a substrate. NH3 plasma processing is performed on a substrate including the TFT. An organic dielectric layer is formed on the NH3 plasma processed substrate. A pixel electrode electrically contacting the TFT is formed on the organic dielectric layer. The forming of the TFT includes forming a gate electrode(110) on the substrate, forming a gate dielectric layer(120) on the substrate to cover the gate electrode, forming an active layer overlapping the gate electrode on the gate dielectric layer, and forming a source electrode(142) partially contacting the active layer and a drain electrode(144) separated from the source electrode at a predetermined interval and partially contacting the active layer.</p>
申请公布号 KR20070119794(A) 申请公布日期 2007.12.21
申请号 KR20060054168 申请日期 2006.06.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, YANG HO;KANG, HOON;KIM, JAE SUNG;LEE, HI KUK;WHANGBO, SANG WOO
分类号 G02F1/136;H01L29/786 主分类号 G02F1/136
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