发明名称 MICROFABRICATION USING REPLCIATED PATTERNED TOPOGRAPHY AND SELF-ASSEMBLED MONOLAYERS
摘要 A method of selectively and electrolessly depositing a metal onto a substrate having a metallic patterned-nanostructure surface is disclosed. The method includes providing a tool having a patterned-nanostructure surface, the patterned-nanostructure surface having surface regions having a nanostructured surface, replicating the tool patterned-nanostructure surface onto a substrate to form a substrate patterned-nanostructure surface, disposing a metal layer on the substrate patterned-nanostructure surface to form a metallic patterned-nanostructure surface region, forming a self-assembled monolayer on the metallic patterned-nanostructure surface region, exposing the self-assembled monolayer to an electroless plating solution comprising a deposit metal, and depositing electrolessly the deposit metal selectively on the surface regions having a metallic nanostructured surface. Articles formed from this method are also disclosed.
申请公布号 WO2007021527(A3) 申请公布日期 2007.12.21
申请号 WO2006US29848 申请日期 2006.07.31
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 NGUYEN, KHANH P.,;FREY, MATTHEW H.,;ZHANG, HAIYAN,;ZHANG, JUN-YING,
分类号 C23C28/00;C23C18/16 主分类号 C23C28/00
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