发明名称 METHODS OF DIE SAWING AND STRUCTURES FORMED THEREBY
摘要 A structure includes a substrate having a plurality of scribe line areas surrounding a plurality of die areas. Each of the die areas includes at least one first conductive structure formed over the substrate. Each of the scribe line areas includes at least one active region and at least one non-active region. The active region includes a second conductive structure formed therein. The structure further includes at least one first passivation layer formed over the first conductive structure and second conductive structure, wherein at least a portion of the first passivation layer within the non-active region is removed, whereby die-sawing damage is reduced.
申请公布号 US2007293019(A1) 申请公布日期 2007.12.20
申请号 US20060424367 申请日期 2006.06.15
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 JENG SHIN-PUU;TSAI HAO-YI
分类号 H01L21/00 主分类号 H01L21/00
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