| 摘要 |
PROBLEM TO BE SOLVED: To provide a transport member with a cleaning function which is superior in foreign matter removing performance and transport performance, and especially efficiently removes the foreign matter, even when using a substrate processor holding a substrate in a vacuuming system, and also to provide a method of cleaning a substrate processor using such a transport member with the cleaning function. SOLUTION: The transport member with a cleaning function has a recess at least in one side of the member with a cleaning layer provided in the recess. The cleaning method of a substrate processor comprises transporting the transport member with the cleaning function in the substrate processor. COPYRIGHT: (C)2008,JPO&INPIT
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