发明名称 |
BATCH-TYPE DEPOSITION APPARATUS HAVING A GLAND PORTION |
摘要 |
Batch-type deposition apparatus having a gland portion are provided. The apparatus include a reaction furnace, a gas nozzle located in the reaction furnace, a gas supply conduit located outside the reaction furnace and a gland portion for connecting the gas nozzle to the gas supply conduit. The gland portion includes a gas nozzle end extended from the gas nozzle toward an outside region of the reaction furnace and a gas supply conduit end extended from the gas supply conduit. The gas nozzle end is connected to the gas supply conduit end through a buffer member. The buffer member has an inclined inner wall for connecting an inner wall of the gas nozzle end to that of the gas supply conduit end.
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申请公布号 |
US2007289531(A1) |
申请公布日期 |
2007.12.20 |
申请号 |
US20070849927 |
申请日期 |
2007.09.04 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HWANG KYOUNG-HWAN;KIM JIN-SUNG;OK CHANG-HYUK;WOO JAI-YOUNG;CHOI MIN-HO |
分类号 |
C23C16/00;H01L21/205;C23C16/40;C23C16/44;C23C16/455;C23C16/458 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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