| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure system for performing highly precise positioning while suppressing the action of a mask and a substrate from being disturbed. <P>SOLUTION: Since an alignment detection device 200 is mounted on a substrate stage 114, the movement of the mask M and the substrate W is suppressed from being disturbed. In addition, a light flux from a laser light source 202 is reflected toward a mask mark MM, and since a half mirror 203 transmitting the light flux reflected from the mask mark MM is provided, detection of images is suitable without passing the same mark two times by the light flux from the laser light source 202. <P>COPYRIGHT: (C)2008,JPO&INPIT |
