发明名称 Microstructure and method of manufacturing the same
摘要 A method of manufacturing a microstructure wherein an aluminum member having an aluminum substrate and a micropore-bearing anodized film present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving the anodized film until a barrier layer has a thickness of 3 to 50 nm, and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized film so that a ratio of a diameter of a micropore opening "a" to a micropore diameter at a height "a/2" from a micropore bottom "b" (a/b) is in a range of 0.9 to 1.1, whereby the microstructure having micropores formed on a surface thereof is obtained. The manufacturing method enables microstructures having an ordered array of pits to be obtained in a short period of time.
申请公布号 US2007289945(A1) 申请公布日期 2007.12.20
申请号 US20070808502 申请日期 2007.06.11
申请人 FUJIFILM CORPORATION 发明人 HATANAKA YUSUKE;TOMITA TADABUMI;HOTTA YOSHINORI;UESUGI AKIO
分类号 B44C1/22;C23F1/00 主分类号 B44C1/22
代理机构 代理人
主权项
地址
您可能感兴趣的专利