| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an abrasive composition free from coagulation or sedimentation of abrasive grain in long time preservation, free from change in the shape of the abrasive grain, inexpensive and highly stable. <P>SOLUTION: The abrasive composition comprises colloidal silica, an organic acid and sodium ion. The interaction between colloidal silica is small as compared to the case in which the colloidal silica is free from sodium ion, since the colloidal silica is surrounded with sodium ion by including the sodium ion. The colloidal silica exhibits a high dispersing property, free from coagulation and sedimentation in long time preservation and keeps the shape of the abrasive grain even making the abrasive composition acidic by adding the organic acid. The colloidal silica is highly dispersible so the particles grown to the average particle size of about 100 nm is not necessitated and the cost for producing is reduced. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
