| 摘要 |
There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR 2 ) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR 2 ), is provided with a measuring device ( 60 ) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR 2 ). |
