| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical component suitable for detecting light having a large NA in an exposure apparatus. <P>SOLUTION: A method is provided for manufacturing the optical component to be used in the exposure apparatus which exposes a substrate by projecting a pattern of a reticle on the substrate via a projection optical system. The method includes a diffusion plane formation process wherein a diffusion plane 3 is formed on a first plane of the translucent substrate 1S, and a mark formation process wherein a mark 2 is formed on a second plane of the translucent substrate 1S. <P>COPYRIGHT: (C)2008,JPO&INPIT |
