发明名称 Method and apparatus for variable polarization control in a lithography system
摘要 A polarization control device for a lithography system selectively polarizes light in horizontal, vertical and/or circular orientations. A pair of relatively rotatable quarter-wave plates move to provide the desired polarization. When the quarter-wave plates are at a relative angle of 45 degrees, the polarization is circular. When the quarter-wave plates are both at zero or 45 degrees, the resulting polarization is vertical or horizontal. The polarization is selected based on the orientation of an image to be projected. Horizontal polarization is preferably used for images with a strong horizontal orientation, and vertical polarization is selected for images with a strong vertical orientation. Circular orientation is selected when the image has no strong horizontal or vertical orientation.
申请公布号 US2007291248(A1) 申请公布日期 2007.12.20
申请号 US20070892608 申请日期 2007.08.24
申请人 ASML HOLDING N.V. 发明人 MCCARTHY MATTHEW
分类号 G03B27/72 主分类号 G03B27/72
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