发明名称 Method of manufacturing multilayer wiring substrate, and multilayer wiring substrate
摘要 The present invention provides a method of manufacturing a multilayer wiring substrate, which can preserve the dimensional stability of a conductor pattern at a fine pitch, solve the restriction on a process from the viewpoint of material selection, and further reduce a manufacturing cost, and a multilayer wiring substrate. A second wiring substrate formed on a supporting sheet made of metal and an adhesive layer are partially stacked on a predetermined region of a first wiring substrate by using the supporting sheet. After the lamination of the second wiring substrate, the supporting sheet is finally etched and removed. The second wiring substrate is stacked only on the portion required to be multilayered on the first wiring substrate to thereby reduce the amount of the construction material of the second wiring substrate.
申请公布号 US2007293038(A1) 申请公布日期 2007.12.20
申请号 US20070890892 申请日期 2007.08.08
申请人 SONY CORPORATION 发明人 ASAMI HIROSHI;KUSANO HIDETOSHI;NISHITANI YUJI;ORUI KEN
分类号 H01L21/4763;H05K3/22;H01L23/12;H05K3/00;H05K3/20;H05K3/46 主分类号 H01L21/4763
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