| 摘要 |
PROBLEM TO BE SOLVED: To provide the photosensitive resin composition capable of forming a resist pattern small in light absorption in specified wavelengths and superior in light transmittance and high in resolution and superior in resistance to dry etching by incorporating a inonomer having an aromatic ring with at least one N atom on the ester part of a specifued methacrylate ester in the resin composition. SOLUTION: This composition contains the polymethacrylate ester derived from the methacrylate ester monomer including the one having at least one N atom on an aromatic ring in the ester part, thus permitting the obtained polymer to be reduced in light absorption due to theπbond of the aromatic ring in the wavelength region near 193 nm. |
