| 摘要 |
<p>An apparatus for processing a substrate is provided to suppress inflow of a liquid to a driving shaft and a stage and to prevent contamination of a substrate processing unit by forming a capping unit in the substrate supporting unit. A substrate supporting unit(110) includes a stage on which a substrate is loaded. A driving shaft(120) is formed to rotate the substrate supporting unit. A rotary liquid supply unit(130) includes a supply line(131) formed in the inside of the driving shaft to supply a liquid, a connective part(133) connected with the supply line to be protruded upwardly from an upper surface of the stage, and a supply part(135) extended in parallel to the upper surface of the stage from the connective part in order to supply the liquid to a backside of the substrate. A capping unit(140) is inserted between the supply part and the stage in order to suppress inflow of the liquid to the stage and the driving shaft. Further, the apparatus contains a rotating part for rotating the rotary liquid supply unit.</p> |
